3M™ Metal Ion Removal Filter *Online explanation available

ソルベンタム フィルター製品事業部
Metal ions in the solution can be reduced to levels below 50 ppt. Solvents such as PGMEA used in the lithography process, as well as high-purity polymer solutions like BARC, can be effectively removed in a single pass. <Handling of Personal Information> Solventum handles personal information based on the personal information handling policy and privacy policy found at the link below. https://www.solventum.com/ja-jp/home/legal/website-privacy-statement/ Solventum respects your privacy. Solventum and third parties commissioned by Solventum may use the information you provide to communicate, including promotions and the provision of product information and services, in accordance with our personal information handling policy and privacy policy. Please be aware that this information may be stored on servers within the United States. If you do not agree to the use of your personal information, please do not use this system. For more details, please refer to the related products and catalog below.


Related Links
Related catalog

