Technical Data: Automatic Pretreatment with Hydrofluoric Acid and Nitric Acid Using DEENA2
Study on automatic pretreatment using hydrofluoric acid and nitric acid for the decomposition of silica with DEENA2.
This document introduces the examination of automatic pretreatment using hydrofluoric acid and nitric acid for the decomposition (melting) of silica (SiO2) with the use of "DEENA2." Silica (SiO2 and its compounds) involves complicated reagent addition operations in acid decomposition, making it very labor-intensive. Additionally, there are concerns about human exposure to acidic reagents like hydrofluoric acid, which poses risks during analysis. Therefore, we automated the sample pretreatment for ICP and ICP/MS using the automatic pretreatment device "DEENA2" for acid addition and other processes. 【Contents】 ■ Overview ■ What is DEENA2 ■ Keywords ■ Equipment Used ■ Examination Method *For more details, please refer to the PDF document or feel free to contact us.
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