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Automation and Labor Saving: "Pre-treatment Process in the Decomposition (Melting) of Metallic Silicon"

Sample pretreatment for ICP and ICP/MS in the decomposition (melting) of hydrofluoric acid and highly reactive metal silicon!

Silica (SiO2 and its compounds) involves complicated reagent addition operations in acid decomposition, making it very labor-intensive. Additionally, there are concerns about human exposure to acidic reagents such as hydrofluoric acid, which poses risks during analysis. Therefore, using the automated pretreatment device DEENA2 for acid addition and other processes, we automated the sample pretreatment for ICP and ICP/MS. 【Summary (Partial)】 ■ Established a method for fully automated analysis, from the automatic addition of nitric acid and hydrofluoric acid to stirring and dilution. ■ Successfully conducted safe analysis by controlling the reaction with highly reactive metallic silicon and hydrofluoric acid. ■ Achieved nearly zero human exposure to hydrofluoric acid and nitric acid. ■ Completely automated pretreatment tasks that previously required human intervention. ■ Conducted decomposition within a clean bench by using a fume hood. *For more details, please download the PDF or feel free to contact us.

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【Other Overview】 - By using dedicated vials, analysis with ultra-low blanks has become possible. - By automating tasks that previously required human intervention, significant improvements in work efficiency have been achieved. - Automation has led to a substantial reduction in human errors. *For more details, please download the PDF or feel free to contact us.*

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Technical Data: Automatic Pretreatment Using Hydrofluoric Acid and Nitric Acid for the Decomposition (Melting) of Silica (SiO2)

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