HELIOS Sputtering Device for Optical Thin Films
Optical sputtering device from Bühler Leybold Optics
HELIOS is a sputtering device developed for the production of high-quality optical films. It is particularly suitable for the manufacture of multilayer filters that require low absorption and low dispersion. The HELIOS series is available in two types: 400 and 800 (substrate sizes).
basic information
【Features】 - Achieves stable film deposition at a high rate without arcing using PARMS (Plasma Assisted Reactive Magnetron Sputtering) process technology. - Utilizes MF (Medium Frequency) power supply for the deposition of metal oxide and nitride films. - Thickness control is possible with high precision through direct monitoring methods. - Capable of creating filters with over 200 layers and a thickness of 20 microns. - Intermediate refractive index tuning is possible with Co-Sputtering technology. For more details, please feel free to contact us.
Price range
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Model number/Brand name
HELIOS
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