We have started short-term supply of 13.5nm extreme ultraviolet (EUV) planar mirrors.
エドモンド・オプティクス・ジャパン
November 2018 (Bunkyo-ku, Tokyo) – Edmund Optics® (EO) of the United States has launched its Japanese subsidiary, Edmund Optics Japan, Inc., which has begun the release of flat mirrors for extreme ultraviolet (EUV) applications. These mirrors are designed with precision-polished multilayer coatings to achieve maximum reflectivity at the designed wavelength and angle of incidence (AOI). They are suitable for beam steering of EUV radiation and harmonic separation. 【Features】 ■ Maximum reflectivity at 13.5nm ■ Ideal for CDI and materials science research *For more details, please refer to the page below or feel free to contact us.
