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31～49 item / All 49 items
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Alumina abrasive material 'A' suitable for precision grinding stones and polishing cloths for ultra-finish.
Maintains stable polishing performance! Suitable for materials such as precision grinding stones for ultra-finish and ultra-finish polishing cloths.
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Diamond slurry polishing material "DIATEC"
Diamond slurry polishing material suitable for lapping ferrite, superhard metals, ceramics, and more.
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Black carbonized silicon grinding material 'C'
Alpha-type silicon carbide abrasive material used for precision lapping of grinding cloth, ultra-fine precision grinding stones, cast iron, brass, etc.
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Wire saw, high-purity α-type silicon carbide abrasive material for wrapping processing 'GC'
Resistant to chemicals, it self-generates sharp grinding edges through crushing, demonstrating excellent polishing power!
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Polishing and etching materials for compound semiconductors, 'INSEC'
Finishing compound semiconductor crystals to a mirror-like precision through mechanochemical processing!
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Increase the yield of thermal spraying with 'Thermal Spray Powder SURPREX'
Production of thermal spray powders adjusted to the desired granularity! Achieving high adhesion efficiency while avoiding issues such as spitting. *Free explanatory materials on thermal spray powders.
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Alumina polishing material for metals 'FM'
It is possible to achieve a clear polish even on fine structures such as high-speed steel and alloys! The use of materials like cloth and felt is also acceptable. Processing is easy.
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99.9% pure α-alumina polishing material 'FS'
Ultra-fine particles with a purity of 99.9% and above! For the final finishing of contact lenses and precision machine parts.
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High-purity alumina polishing material 'FAL'
Contact lenses, alumina polishing material suitable for polishing soft metals.
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General metal mirror finish silica polishing material "CLEALITE"
For general metals such as copper, aluminum, stainless steel, and titanium!
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"FZ" zirconia polishing material for special alloys and optical lenses.
A deep, scratch-free glossy surface unique to metal!
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Alumina-based precision wrapping material "FO"
Exhibits excellent processing performance for optical materials such as semiconductor wafers and lenses! Precision lapping materials made from carefully selected materials.
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High Purity Colloidal Silica Slurry Polishing Material 'COMPOL'
Achieve a damage-free polished surface with high efficiency! Mirror finishing is possible on various materials such as electronic material substrates like sapphire, metals, and ceramics.
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Polishing material for semiconductor devices "PLANERLITE"
A polishing material suitable for those seeking "high purity, high processing efficiency, high dispersion, and scratch-free."
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Presentation of materials | For selecting "polishing products" for grinding!
A diverse lineup and high cost performance available in abundance! As selection materials for choosing polishing products suitable for processed items.
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Presentation of materials | Are you choosing the right abrasive for the material being processed?
We offer materials for wire saws, including documents that help select abrasives and related products suitable for the "processing methods × workpieces" of fine ceramic materials!
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Polishing material for plastic lenses "POLIPLA"
A wide variety is available! You can achieve a high polishing rate and a good finish surface.
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Colloidal silica polishing material for silicon wafers 'GLANZOX'
Meeting the demands for higher flatness, damage-free, and free from heavy metal contamination with a complete mirror finish!
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Fujimi Powder Technology "Angular Nano Alumina"
Very sharp particle size distribution! Introducing powder technology with uniform particle diameter.
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