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Low metal and low particle solutions for precision machinery.

We will leverage our expertise in semiconductor manufacturing to contribute to the improvement of precision in machinery.

In the precision machinery industry, reducing the cleanliness of components, particularly metal impurities and particles, is crucial for enhancing product performance and longevity. These impurities can cause wear and performance degradation of machine parts, potentially compromising product reliability. Our products contribute to improving the precision of precision machinery by managing metal concentrations at the ppb level and controlling the number of particles around 100nm in size, utilizing adsorption and filtration technologies developed in semiconductor manufacturing. 【Application Scenarios】 - Cleaning of precision machine parts - High-precision polishing processes - Component management in cleanroom environments 【Benefits of Implementation】 - Improved product quality - Enhanced yield - Extended lifespan of machine parts

About low metalization and low particle generation, click here for more information.

basic information

【Features】 - Reduction of metal impurities (Li, Na, Mg, Al, K, Ca, Cr, Mn, Fe, Co, Ni, Cu, Zn, Sr, Pd, Sn, Ba, Pb, Ti) - Reduction of particle count (reduction of particles larger than 70nm) - Strict quality control using ICP-MS and liquid particle counters - Maximum processing capacity of 15L (low metal content), 18L (low particle content) - Scale-up under consideration 【Our Strengths】 Fukui Canon Materials Co., Ltd. operates under the philosophy of "creating new value and culture to contribute to the prosperity of the world and the happiness of humanity." We aim for sustainable development by innovatively creating products that meet customer needs through advanced technology and ideas. We leverage the technology cultivated in semiconductor material manufacturing to contribute to solving our customers' challenges.

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Applications/Examples of results

Low metal reduction achievement: Reduced metal concentration from 2000 ppb to 50 ppb. Low particle reduction achievement: In the circulation filtration of PGMEA (4L), particles larger than 70 nm were reduced from 4687 particles/mL to 0.3 particles/mL in 10 hours.

<Case Studies> Contract Synthesis and Purification Services for Semiconductors and Electronic Materials

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Fukui Canon Material Co., Ltd. Company Profile

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Fukui Canon Material Co., Ltd. aims to enhance the comfort of our customers' daily lives through chemical technology, building better relationships between people and between people and chemistry with excellent technology. Under the philosophy of "coexistence," we strive to harmonize the global environment with corporate activities, meet the expectations of our customers, employees, and local communities, and create products that respond to customer needs through innovative technologies and ideas, aiming for sustainable development.