[Book] Trends in Advanced Semiconductor Manufacturing Processes and Miniaturization (No. 2220)
【Available for preview】 - Film formation technology, lithography, etching, CMP, cleaning -
Book Title: Latest Trends in Advanced Semiconductor Manufacturing Processes and Miniaturization Technologies --- ★ Amidst the calls for the limits of Moore's Law, how far will the development of miniaturization technologies continue? A comprehensive book covering the latest technologies in the "front-end" of advanced semiconductor manufacturing, where new structures and materials are being applied. --- ■ Key Points of This Book 1 - Latest trends in EUV lithography and the technical challenges of resists, masks, and light sources - The development history of metal resists that breaks conventional wisdom and future challenges - Recent development cases of atomic layer processes (ALD, ALE) that are rapidly gaining momentum in research and development - Latest trends in nanoimprint systems aimed at mass production applications for next-generation semiconductor memory devices - Latest trends in film deposition technologies and process optimization in semiconductor multilayer wiring - Cleaning performance required for advanced semiconductor manufacturing, the reality of contamination, and the latest cleaning technologies - Latest technologies and process control for high aspect ratio etching that enables the miniaturization of integrated circuits - CMP processes and consumable materials that respond to advancements in miniaturization and new materials, along with performance requirements for post-cleaning.
basic information
■ Table of Contents Chapter 1: Polishing and Processing Technologies for Semiconductor Wafers and Ion Implantation Chapter 2: Trends in Film Formation Technology and Production of High-Quality Thin Films Chapter 3: Trends in the Development of Resist Materials and Coating and Removal Technologies Chapter 4: Trends in the Development of Next-Generation Lithography Technologies and Miniaturization Techniques Chapter 5: Trends in the Development of Dry Etching Technologies and Process Control Chapter 6: Trends in the Development of Wet Etching Technologies Chapter 7: Trends in the Development of CMP Processes and Analysis and Evaluation Techniques Chapter 8: Cleaning Technologies for Semiconductors, Mechanisms, and Analysis and Evaluation Techniques －－－－－－－－－－－－－－－－－－－－－ ● Publication Date: September 29, 2023 ● Format: A4, 630 pages ● Authors: 58 individuals ● ISBN: 978-4-86104-982-8 －－－－－－－－－－－－－－－－－－－－－
Price information
88,000 yen (tax included) [shipping included] Various discount programs are available. Please contact us.
Price range
P2
Delivery Time
P2
Model number/Brand name
2220 Semiconductor Manufacturing Process
Applications/Examples of results
For more details, please contact us.
catalog（1）
Download All Catalogs
News about this product（1）
Recommended products
Distributors
The Technical Information Association is engaged in the work of shaping information for engineers and researchers. We research what kind of information engineers and researchers active in fields such as "research and development," "materials," "electronics," and "pharmaceuticals/medical devices" need, and we create products such as seminars, books, and correspondence courses!