[Book] Semiconductor Plasma Process Technology (No. 2357)
Available for preview - Visualization, Anomaly Detection, High-Precision Process Optimization -
Book Title: Control and Measurement/Monitoring of Semiconductor Plasma Process Technology －－－－－－－－－－－－－－－－－－－－－ ◎ How to achieve optimization of film deposition and etching processes? ◎ Detailed explanation of technologies that visualize plasma and connect to the control of electrons and ions! ◎ Thorough explanation of high-precision process technologies for discharge and reactive plasma! －－－－－－－－－－－－－－－－－－－－－ ■ This book contains the following information: - Techniques for controlling electron density, electron temperature, power control, and gas supply points for discharge plasma and reactive plasma. - Systematization of gas characteristics, exhaust system design technology, measurement technology, and troubleshooting for designing vacuum environments. - Measurement techniques for plasma states using optical emission spectroscopy, quadrupole mass spectrometry, and probe methods. - Measurement of active particle counts, abnormal discharge detection, ion energy distribution, measurement of ion species in plasma, and radical measurement and monitoring technologies. - Low-damage, low-temperature, high-speed film deposition technologies for plasma CVD and ALD processes, control of film density and thickness, and improvement of adhesion. - Film thickness control technologies for sputtering deposition, and control of thin film composition, crystallinity, electrical properties, and mechanical properties.
basic information
- Acceleration of the etching process, reduction of damage, and development of plasma-resistant materials - Mechanisms of particle generation during the process, detection, and countermeasure technologies ---------------------------- ■Table of Contents Chapter 1: Basics of Plasma, Overview of Generation Devices, and Generation/Control Technologies Chapter 2: Design Technologies for Vacuum Environments Chapter 3: Plasma Measurement Technologies, Process Evaluation and Analysis Technologies Chapter 4: Monitoring and Predictive Maintenance Technologies in Plasma Processes Chapter 5: Film Formation Technologies Using Plasma and Low-Temperature Process and Analysis Technologies Chapter 6: Development of Light Sources and Equipment for EUV Lithography Chapter 7: Process Technologies for Plasma Etching and Ashing Chapter 8: Surface Treatment and Cleaning Technologies for Semiconductors Using Plasma ---------------------------- ●Publication Date: June 30, 2026 ●Format: A4 size, 395 pages ●Authors: 41 ●ISBN: 978-4-86798-156-6 ----------------------------
Price information
88,000 yen (including tax) [shipping included] Various discount systems are available. Please contact us.
Price range
P2
Delivery Time
P2
Model number/Brand name
2357 Semiconductor Plasma
Applications/Examples of results
For more details, please contact us.
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[Book] Process Design and Scale-Up through Chemical Engineering Calculations (No. 2359) [Available for preview]
- Necessary physical property values / Important relationships / Modeling / Utilization of AI - ★ No reliance on experience or intuition! Aiming for fast and accurate 'equipment design' and 'operating condition setting' based on calculation results! ★ Covers everything from the physical property values needed for calculations, important relationships, and modeling to the latest examples of AI utilization! ---------------------------- ■ Table of Contents Chapter 1: Basics of Chemical Engineering Chapter 2: Estimation of Physical Properties Chapter 3: Estimation and Simulation for Stirring, Mixing, Reaction Processes, and Equipment Design Chapter 4: Estimation and Simulation for Separation Processes and Equipment Design Chapter 5: Estimation and Simulation for Drying Processes and Equipment Design Chapter 6: Estimation and Simulation for Powder and Granular Processes and Equipment Design ---------------------------- ● Publication Date: June 30, 2026 ● Format: A4 size, 504 pages ● Authors: 35 contributors ● ISBN: 978-4-86798-157-3 ----------------------------
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[Book] Control, Measurement, and Monitoring of Semiconductor Plasma Process Technology (No. 2357) [Available for Preview]
- Visualization, Anomaly Detection, High-Precision Process Optimization - ◎ How can we achieve optimization of film formation and etching processes? ◎ A detailed explanation of the technology that visualizes plasma and connects to the control of electrons and ions! ◎ A thorough explanation of high-precision process technology for discharge and reactive plasma! －－－－－－－－－－－－－－－－－－－－－ ■ Table of Contents Chapter 1: Basics of Plasma, Overview of Generation Devices, and Generation/Control Technologies Chapter 2: Design Technologies for Vacuum Environments Chapter 3: Plasma Measurement Technologies, Process Evaluation and Analysis Technologies Chapter 4: Monitoring and Predictive Maintenance Technologies in Plasma Processes Chapter 5: Film Formation Technologies Using Plasma and Low-Temperature Process and Analysis Technologies Chapter 6: Development of Light Sources and Equipment for EUV Lithography Chapter 7: Process Technologies for Plasma Etching and Ashing Chapter 8: Surface Treatment and Cleaning Technologies for Semiconductors Using Plasma －－－－－－－－－－－－－－－－－－－－－ ● Publication Date: June 30, 2026 ● Format: A4, 395 pages ● Authors: 41 ● ISBN: 978-4-86798-156-6 －－－－－－－－－－－－－－－－－－－－－
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