Spectroscopic ellipsometry with a wide wavelength range (DUV to NIR)
Analysis of wavelengths from 190nm (DUV) to 3,500nm (NIR) allows for the analysis of film thickness and optical constants at user-specified wavelengths.
This is a spectroscopic ellipsometer that adopts a unique method for driving the rotating polarizer (polarization detection). We have developed proprietary software for simultaneous analysis of film thickness and optical constants (refractive index, extinction coefficient), which has undergone several revisions based on requests from long-time users, now reaching its fourth edition. This software features a convenient [Interactive Mode] for analysis and a [Recipe Mode] suitable for repeated measurements. Additionally, it can perform automatic measurements of film thickness distribution, which is helpful for evaluating thickness uniformity.
basic information
The company was established in Berlin, Germany, in 1990. It sells its self-developed plasma application devices and metrology equipment such as spectroscopic ellipsometers worldwide. In 2010, it completed its own building and obtained ISO 9001 certification. To assist users in improving quality, it manufactures robust and high-quality products and provides support that satisfies users around the world.
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Applications/Examples of results
【Applications】 - Non-destructive analysis of the thickness and optical constants (refractive index, extinction coefficient) of transparent films - Quality control of the thickness and optical constants of transparent films, management of in-plane uniformity
