RIBER EZ-CURVE Vacuum Device In-situ Warping Monitor
An in-situ monitor that measures wafer stress, warpage, curvature, anisotropy, etc., in various vacuum devices in real-time and with high precision.
The EZ-CURVE developed by RIBER is an in-situ monitor that can be attached to various vacuum devices and is capable of measuring stress, warping, curvature, anisotropy, and more. Features: 1) Capable of measuring in-situ stress, warping, curvature, anisotropy, etc. 2) Can also be used to obtain basic data on growth mechanisms. 3) Compatible with various vacuum deposition devices (CVD, MBE, PVD, etc.) and vacuum process equipment (etching, annealing, etc.). 4) Compared to conventional laser reflection measurement methods, this instrument achieves over 10 times the sensitivity for warping measurement and a high measurement frequency (100Hz). 5) Compatible with low lattice mismatch material systems such as AlGaAs/GaAs. 6) Capable of handling thick wafers up to several millimeters. 7) Achieves high stability and alignment-free measurement. 8) Uses a white light source, unaffected by changes in reflectivity, and does not require adjustment of exposure time. 9) Does not affect the flatness of the wafer and can measure patterned wafers. 10) Capable of sharing data with other software. Specifications: 1) Curvature measurement range: 0.0008 to 200,000 Km-1 2) Radius range (Max-Min): 1,250,000 to 0.005m
basic information
RIBER, a French company, is the world's number one supplier of molecular beam epitaxy (MBE) equipment and components (MBE cells and evaporation sources), established in 1964. It has delivered approximately 800 units to the market, primarily for the deposition of compound semiconductor materials such as GaAs, InP, and GaN. Currently, major universities, public research institutions, device manufacturers, and epitaxial foundries around the world operate RIBER's MBE equipment, contributing as research or production tools in various cutting-edge fields such as data communication, 5G/6G, VCSEL lasers, photonics, sensors, and 3D sensing. In Japan, Hakuto Corporation serves as the general agent, providing sales and maintenance services for the company's products.
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Applications/Examples of results
【Purpose】 - Various vacuum devices that require real-time, high-precision measurement of wafer stress, warping, curvature, anisotropy, etc. 【Examples of Achievements】 - Calculation of material composition ratios - Continuous observation of multilayer film curvature (stress) → Estimation of correction values for deviations in growth parameters - Compatible with various vacuum deposition devices (CVD, MBE, PVD, etc.) and vacuum process devices (etching, annealing, etc.) - Real-time observation of stress relaxation states - Calculation of strain correction
