Electron beam drawing device
We offer a lineup of electron beam lithography systems, ranging from high-precision types with an acceleration voltage of 100 kV to universal types with SEM functionality, capable of meeting various needs.
The EBPG series from Raith is a high-speed, high-precision electron beam lithography system designed for small-scale production, with over 130 units delivered worldwide. Features of EBPG: ● Maximum current of 350 nA, achieving the fastest throughput in the industry ● High-precision drawing possible with overlay below 5 nm and stitching below 8 nm ● Automatic aperture change during drawing according to pattern size, reducing drawing time ● Maximum substrate size of 8 inches ● Auto airlock for mass production (up to 10 holders) Lineup of electron beam lithography systems for research and development: ● Pioneer Two (EBL-SEM hybrid) supports up to 50mm x 50mm ● eLINE Plus supports up to 4 inches ● Raith150 Two supports up to 8 inches ● Voyager (with mini engine) supports up to 8 inches
basic information
Raith GMBH, headquartered in Dortmund, Germany, was established in 1980 and has been providing nanofabrication solutions centered around electron beam lithography for over 40 years.
Price range
Delivery Time
Applications/Examples of results
Application examples: - Compound semiconductors - Optoelectronics - Nanophotonics - Quantum computers - Security/holograms - Masks - Others
