Laser drawing device
Industry high-level high-resolution or high-throughput maskless laser direct writing equipment
Raith is known as a company that provides advanced technology in the field of nanofabrication, developing and designing cutting-edge tools including FIB-SEM and maskless EB direct writing systems. The company has a product lineup particularly suitable for fine pattern formation and nanoscale structure creation, which is utilized by a wide range of research institutions and industries. In 2021, it further expanded its product portfolio by acquiring 4PICO litho, a company that developed and manufactured maskless laser direct writing systems. Raith's tools support not only patterning on various substrates but also 3D structuring, boasting over 1,200 units delivered worldwide.
basic information
◆PICOMASTER Series Main Specifications ・Feature size: 200nm ・Min Line width: 300nm ・Gray Scale: 4096 ・Substrate size: Max 230 x 230 mm² ・Light source: Gan Laser 405nm *The above specifications are for a tool designed for exposure of □200mm. Models for □100 and □150, as well as an optional light source of 375nm, are also available. ◆PICOMASTER XF Series Main Specifications ・Feature size: 500nm ・Min Line width: 600nm ・Gray Scale: 256 ・Substrate size: Max 250 x 250 mm² ・Light source: Gan Laser 405nm ・Max write speed: 560mm²/min *The above specifications are for a tool designed for exposure of □200mm. For specifications of other sample sizes, please inquire. (Max □1,400mm compatible)
Price range
Delivery Time
Applications/Examples of results
Application examples: - Photonic devices - Diffraction gratings - Microfluidics - Security/Holograms - Masks - Others
