Centrotherm Ultra High Temperature Bulk Annealing Furnace
By achieving ultra-high temperature treatment and excellent temperature uniformity, batch processing of boule ingots and wafers is possible, minimizing defects and dislocations.
To improve the yield of wide bandgap semiconductor devices, it is necessary to minimize defects and dislocations caused by stress. One of the methods to achieve this is through ultra-high temperature thermal treatment of semiconductor crystals. The c.CRYSCOO HTA high-temperature annealing furnace has been developed to significantly enhance productivity in the value chain from bulk crystals of wide bandgap semiconductors to devices. With excellent temperature control (maximum temperature of 2200°C), uniformity, and low cross-contamination, the c.CRYSCOO HTA demonstrates superior performance compared to conventional furnaces. It is capable of simultaneously processing more than 10 boule ingots or over 100 unprocessed wafers.
basic information
Centrotherm (officially centrotherm international AG) is a global manufacturer specializing in thermal processing furnaces, established in 1958. They offer a wide range of products, including vacuum reflow furnaces, diffusion furnaces, LPCVD, and high-speed lamp annealing furnaces, contributing to thermal processing in the fields of solar cells and semiconductors. In Japan, since 2006, Hakuto Co., Ltd. has been the general agent responsible for the sales and maintenance services of the company's products. They have numerous achievements in the mass production scenes of major device manufacturers, including SiC power devices and MEMS sensors.
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Applications/Examples of results
【Purpose】 - Reduction of defects and dislocations in compound semiconductor materials such as SiC power semiconductor wafers, boule, and ingots. 【Examples of Achievements】 - Various wafer and device manufacturers are operating centrotherm's thermal processing equipment, contributing as research or production tools in cutting-edge fields.
