Electrodeposition agent for positive photoresist for microfabrication "Hani Resist AP"
Photoresist-type electrocoating paint suitable for fine processing of electronic components and similar applications!
"Hani Resist AP" is a fine processing positive-type resist electrocoating agent developed based on the electrocoating technology for aluminum building materials (electrocoating resin synthesis technology, electrocoating liquid management technology, electrocoating process technology) that has been cultivated over many years by Honey Kasei and is pioneering in the world. It enables high-speed processing via Reel to Reel for printed circuit boards and COF/TCP (film formation possible in 10 seconds of energization) and allows for fine processing. It also excels in processing capabilities within through-holes, making it easy to form coatings on three-dimensional structures. 【Features】 ■ High-speed processing ■ High resolution ■ Uniform coating thickness ■ Alkaline development, alkaline stripping type *For more details, please refer to the catalog or feel free to contact us.
basic information
【Application Example】 ■ Fine line formation on printed circuit boards Line/Space = 10μm/10μm pattern *For more details, please refer to the catalog or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
【Usage】 ■ Electrodeposited resist for etching ■ COF・TCP ■ Printed circuit boards *For more details, please refer to the catalog or feel free to contact us.
