Development of "Crystal Etching Solution" for Crystal Devices
Hayashi Pure Chemical Ind., Ltd. Electronic Materials
Lin Jun Pharmaceutical Industry Co., Ltd. has developed a crystal etching solution for crystal devices. Etching solutions commonly used for wet etching of crystals include hydrofluoric acid (HF) and a mixed solution of HF and ammonium fluoride (NH4F), but they have various issues. Therefore, our company has developed a crystal etching solution that reduces the angle difference in taper angles of cross-sectional shapes due to etching, enabling the flattening of the etched surface and uniform etching thickness through our unique technology. □ For other functions and details, please refer to the materials.
