High purity gas valve
High purity gas valve
Introduction of high-purity gas valves.
31～38 item / All 38 items
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High-Temperature Resistant Valve SCV Submersible Valve 'TD-S Series'
A valve compatible with an integrated gas system that can be used with various gases in high-temperature environments (up to 200°C).
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Case Study: Measures to Prevent Loosening of Valve Handles During Equipment Transport *Currently Available for Free
"Complete Case Study of Flow Paths" Taking proactive measures against risks during the transportation of semiconductor gas supply equipment. Presenting examples of safety measures.
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Case Study: Measures Against Incorrect Valve Operation Due to Human Error *Currently Available for Free
Complete Case Study of Flow Paths: Lock valves with locks and tagged wires! Presenting examples of measures against valve misoperation.
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Case Study: Space-saving of Exhaust System Line for Semiconductor Manufacturing Equipment *Currently available for free.
What are the value criteria for devices sought by device manufacturers? KITZSCT helps improve space-saving design and construction efficiency for exhaust system lines.
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High-temperature resistant diaphragm valves "ZD Series" "ZD-K Series"
The high-purity gas series valves, ZD series and ZD-K series, are diaphragm valves that allow for detachable and replaceable seat components and can be used in high-temperature environments.
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High-temperature compatible diaphragm valve with detachable PFA sheet section.
High-purity gas valves suitable for material containers and semiconductor manufacturing processes. The seat can be detached and replaced, and it can be used in high-temperature environments up to 250 degrees.
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High-Temperature Compatible Diaphragm Valve for Semiconductors
Diaphragm valve that achieves stable supply even in high-temperature environments.
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[Information] Introduction of valves used in equipment and facilities at semiconductor manufacturing plants.
From film formation to etching and cleaning! Introducing the valve conditions and product examples required for each process.
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