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EUV light source
LPP-EUV light source that achieves high brightness and low debris.
basic information
- Reduce adhesion of scattered debris to the optical system - Achieve a stable target surface through high-speed rotation of the target - Achieve a maximum output of 44 mW (13.5nm±1%) (TEUS S-400)
Price range
Delivery Time
Model number/Brand name
ISTEQ・TEUS Series
Applications/Examples of results
- Research and inspection of EUV mask blanks - Research and inspection of optical components for EUV - Mask and surface inspection - Materials science - Wafer inspection
