Mass production support and small batch production support! A system that automatically handles the series of processes for resist coating, baking, and cooling.

We would like to introduce the "Resist Coater" that we handle. We can also accommodate manual specifications upon request. The work sizes supported are Φ2" to 12" wafers and 100□ to 320□ mm square substrates. The work materials include Si, SiC, GaN, GaAs, InP, LT/LN, ceramics, quartz, resin, glass, etc. The viscosity of the coating material ranges from 100CP to 8,000CP. 【Specifications (partial)】 ■ Work transport: Multi-joint clean robot with backside suction method ■ Two-stage cup (upper stage: resist, lower stage: rinse) ■ Resist liquid: Photoresist, polyimide-based (can accommodate built-in canisters) ■ Bake: 90℃ to 120℃ ±1℃ (proximity/contact selection) ■ Cool plate: 10℃ to 25℃ (proximity/contact selection) *For more details, please download the PDF or feel free to contact us.

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