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"Global Market for Soft CMP Pads: Abrasive Type, Normal Type, 300mm Wafers, 200mm Wafers" Research Report Now Available for Sale

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マーケットリサーチセンター

This research report (Global Soft CMP Pads Market) investigates and analyzes the current status and outlook for the global soft CMP pads market over the next five years. It includes information on the overview of the global soft CMP pads market, trends of major companies (sales, selling prices, market share), market size by segment, market size by major regions, and distribution channel analysis. The segments by type in the soft CMP pads market focus on abrasive types and normal types, while the segments by application target 300mm wafers and 200mm wafers. The regional segments calculate the market size of soft CMP pads by dividing them into North America, the United States, Europe, Asia-Pacific, Japan, China, India, South Korea, Southeast Asia, South America, the Middle East, and Africa. It also includes the market share of major companies in the soft CMP pads sector, product and business overviews, and sales performance.

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Soft CMP Pads are consumables used in chemical mechanical polishing (CMP) processes, which are part of semiconductor manufacturing. They are primarily used to smooth out the fine irregularities on the surface of wafers. The soft type is flexible and suitable for processes that require precise control.
Compared to conventional hard-type CMP pads, soft CMP pads offer the advantage of achieving uniform polishing even at low pressures, making them less likely to damage delicate layer structures and complex patterns. This has led to their increased use in advanced node processes and multilayer wiring processes.
Soft CMP pads play a crucial role, particularly in damascene wiring technology and the polishing of interlayer dielectric films (ILD), contributing to improved yield and reduced defects. As miniaturization progresses, the performance requirements are increasing year by year.
The main materials used are polyurethane and non-woven fabric, and the surface structure, hardness, and porosity of the pads significantly affect product performance. Manufacturers are advancing the development of customized pads according to customer requirements.
In the semiconductor industry, CMP processes are being introduced in various devices such as logic ICs, memory, and image sensors, and the soft CMP pad market is expanding accordingly. The ability to support advanced nodes is key to market competitiveness.
Geographically, the Asia-Pacific region is the largest market, particularly with strong demand in semiconductor manufacturing hubs in South Korea, Taiwan, Japan, and China. Adoption is also progressing in North America and Europe for high-value-added products.
Major companies include Dow Chemical, Daifuku, TOHO Technology, and pad development companies collaborating with photoresist manufacturers, and there is active technological competition in the market regarding high performance and longevity.
In the future, it is expected that the growth of 3D NAND and advanced logic devices will lead to an increased demand for high-precision polishing. Collaboration with environmentally friendly materials and AI-based polishing control is also gaining attention.