Composite PVD coating equipment

Equipped with three sources of arc ion in a single chamber! We propose a composite ion plating device.

ISYS Corporation's hybrid PVD coating equipment is designed according to specifications, including chamber dimensions and the number of sources. The HCD-equipped arc ion plating device features a combined installation of deposition sources (HCD [Hollow Cathode] + AIP [Arc Ion]). Bombardment with HCD uses Ar ions with an ionization rate of 90% for powerful etching. The shutter system reduces droplets through a front shutter on the deposition source. The uniquely developed iD film generates a film with a compositional gradient in the depth direction. The iD film application films include TiN, CrN, TiCN, TiCrN, TiAlN, AlTiN, ZrN, TiZrN, TiSiN, TiAlSiN, and applications include surface modification for cutting tools, molds, electronic components, as well as coloring for decorative steel plates, mobile phone cases, doors, etc. For more details, please contact us or refer to the catalog.

basic information

【Features】 [HCD Equipped Arc Ion Plating Device] ○ Designed according to specifications, including chamber dimensions and number of sources ○ Composite mounting of film deposition sources: HCD [Hollow Cathode] + AIP [Arc Ion] ○ Bombardment with HCD: Powerful etching with Ar ions at an ionization rate of 90% ○ Shutter method: Reduction of droplets by a shutter in front of the film deposition source ○ Proprietary developed iD film: Generates films with a composition gradient in the depth direction ○ Films applicable with iD film: TiN, CrN, TiCN, TiCrN, TiAlN, AlTiN, ZrN, TiZrN, TiSiN, TiAlSiN ○ Applications → Surface modification: Cutting tools, molds, electronic components, etc. → Coloring: Decorative steel plates, mobile phone cases, doors, etc. 【Device Variations】 ○ HCD Ion Plating Device ○ HCD Equipped Sputtering Device ○ Sputter Inline Device ● For more details, please contact us or refer to the catalog.