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"Steam two-fluid cleaning device" that uses steam instead of chemical agents for cleaning.

A new technology born from the semiconductor industry! By spraying steam at supersonic speeds, it removes "dirt"! Since no chemicals are used, waste liquid treatment is simple and cost-effective!

The steam two-fluid cleaning device removes dirt and microscopic foreign substances through shock waves (cavitation) generated by supersonic injection and shear force. Additionally, since it does not use chemicals, waste liquid treatment is simple and low-cost. 【Features】 ■ Removes dirt by injecting steam at high speed ■ No chemicals used, making waste liquid treatment simple and cost-effective ■ Cleans using only water, ensuring environmental consideration and safety ■ Non-contact, resulting in fewer consumables ■ Capable of removing oil-based markers and oil stains 【Applications and Achievements】 ■ Photoresist stripping (semiconductors, LEDs) ■ Polymer and particle removal (semiconductors) ■ Gold film lift-off (semiconductors, LEDs) ■ Cleaning after polishing (semiconductors, resin processing) Others *For product details, please contact us separately or view the PDF data from the download.

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【Other Applications and Achievements】 ■ Flux removal (PCB) ■ Foreign matter removal (electronic components such as OLED, LCD, capacitors, etc.) ■ Adhesive removal (semiconductors, PCB) ■ Cleaning of polishing cloths (metal and resin processing) *For product details, please contact us separately or view the PDF data from the download.

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For product details, please contact us separately or view the PDF data from the download.

"Steam two-fluid cleaning device" that uses steam instead of chemical agents for cleaning.

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