This is a research and development RF/DC magnetron sputtering device. Despite its high performance and multifunctionality, it fits into limited laboratory space with a compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ High-precision APC process control with MFC ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, vertical lift, and heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller

Max 1000℃, MFC up to 3 systems, APC pressure control, compatible with substrates from 4" to a maximum of 6", high vacuum annealing device (<5 × 10-7 mbar) [ANNEAL] is a research and development annealing device capable of high-temperature heat treatment of substrates such as wafers in a stable process atmosphere. It allows high-temperature processing up to 1000℃ using a heating stage installed in a high vacuum water-cooled SUS chamber. A heat shield is installed inside the chamber to ensure safety through interlock. The mass flow controller can be expanded to a maximum of 3 systems, enabling firing operations with precisely adjusted process gas pressure (APC automatic process control system option). Additionally, there are many options available, including a front view port, dry scroll pump, special substrate holder, and additional thermocouples. The heating stage inside the chamber has three variations depending on the process gas atmosphere and treatment temperature: - Halogen lamp heater: Max 500℃ - C/C composite heater: Max 1000℃ (in vacuum, inert gas only) - SiC coating heater: Max 1000℃ (vacuum, inert gas, O2)

We exhibited at the "INCHEM TOKYO 2025 Exhibition" held at Tokyo Big Sight from September 17 (Wednesday) to September 19 (Friday). Thank you very much for visiting our booth despite your busy schedule. 【Details of Exhibits】 ■ New Product: EX-Bio Clean Diaphragm Valve ■ Renewal: Glass Lined Diaphragm Valve ■ Ball Valve Series Suitable for a Wide Range of Fields ■ Various Lined Bodies with Excellent Corrosion and Chemical Resistance ■ PFA Lined Butterfly Valve ■ Sanitary Butterfly Valve for Powder and Granule Discharge *For more details, please download the catalog or contact us. (The catalog can be downloaded from the catalog page of the special website below.) *If there were any requests or questions that we could not address at the venue, please feel free to contact us.

<30W Low Power Control for Damage-Free Etching Achieves delicate etching processes with an output control precision of 10mW. A jointly developed product with the graphene research group at the University of Manchester, led by Nobel Prize winners who discovered graphene in 2010. 【Features】 • 2D (Transition Metal Chalcogenides, graphene delamination after material transfer): Surface modification cleaning • Removal of polymer resists such as PMMA and PPA • Surface modification and etching on substrates prone to damage, such as Teflon substrates • h-BN sidewall etching (*Option for "Fluorine Gas Supply Module," requires SF6 gas system) • SiO2 etching (*Option for "Fluorine Gas Supply Module," requires CHF3 gas system) 【Specifications】 ◉ Compatible substrates: Up to Φ6 inches ◉ Easy operation with a 7" touch panel and PLC automatic sequencing ◉ Automatic pressure control (APC) ◉ One Ar gas line (standard) + up to three additional lines for N2 and O2 ◉ Connects to a Windows PC with a USB port for automatic etching recipe creation and storage. Data logging on PC.

Our company will be exhibiting at "INCHEM TOKYO 2025," which will be held at Tokyo Big Sight from September 17 (Wednesday) to September 19 (Friday). This exhibition is a specialized event for the chemical and process industries, and we will showcase a variety of valve products suitable for a wide range of industrial fields, including chemicals, environmental and water treatment, and pharmaceuticals, focusing on diaphragm valves, ball valves, and butterfly valves. 【Highlights of Our Exhibition】 ◆ New product "EX-Bio Clean Diaphragm Valve" launching in July! A next-generation diaphragm valve utilizing a new sealing structure! We have further enhanced the leakage prevention performance! ◆ Renewed products responding to many requests! The "Glass-Lined Diaphragm Valve" has been renewed! ◆ In addition, we will display various valve products suitable for a wide range of industrial fields such as chemicals, environment, water treatment, and pharmaceuticals! ◆ Our company representatives will provide explanations and proposals using actual samples! We sincerely look forward to your visit! For more details, please refer to the related document "Invitation to INCHEM TOKYO 2025 (General Invitation)" below or feel free to contact us.

◉ High-efficiency and high-precision process control using cold wall method ◉ Rapid heating: 1100℃ in approximately 3 minutes ◉ High-precision temperature control: ±1℃ ◉ High-precision APC automatic pressure control system: 3 gas lines (Ar, H2, CH4) ◉ Standard recipe for graphene production included ◉ Compact size: 405(W) x 415(D) x 280(H) mm ◆Features◆ - Easy operation! Operation and recipe management via 5-inch touch panel - Up to 30 recipes and 30-step program creation possible - PC software included for USB cable connection, offline recipe creation on PC → upload/download to device, CSV data output - Maximum sample size: 40 x 40 mm: Copper (nickel) foil, SiO2/Si, Al2O3/Si substrates, etc. ◆Model: nanoCVD-8G◆ - Standard program for graphene included - High vacuum process, high-precision process pressure control - Rotary pump included as standard - 3 gas supply lines (Ar, H2, CH4) - Sample heating stage (high-purity graphite) Max 1100℃ - K-type thermocouple

We exhibited at the "27th INTERPHEX JAPAN Exhibition," which was held at Tokyo Big Sight from July 9 (Wednesday) to July 11 (Friday). Thank you very much for visiting our booth despite your busy schedule. 【Details of Exhibits】 ■ New Product: EX-Bioclean Diaphragm Valve ■ Renewal: Glass-Lined Diaphragm Valve ■ Products Excellent for Dead Space Solutions ■ Corrosion-Resistant Valves with Sanitary Specifications ■ For Powder and Granule Discharge: Sanitary Butterfly Valve *For more details, please download the catalog or contact us. (The catalog can be downloaded from the catalog page of the special website below.) *If you have any requests or questions that we could not address at the venue, please feel free to contact us.

◉ Maximum operating temperature Max 2000℃ ◉ PLC semi-automatic control A higher model of the tabletop Mini-BENCH with semi-automatic control Automatically controls each process of "vacuum/purge cycle," "gas replacement," and "venting" Maximum operating temperature 2000℃ Semi-automatic control ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace ◉ Effective heating range (crucible dimensions) - Planar heater heating range: Φ2 inch to Φ6 inch - Cylindrical heater heating range: Φ30 to Φ80 x Depth Max 100(H) mm ◉ Up to 3 MFC systems for automatic flow control (or manual adjustment) ◉ APC automatic pressure control ◉ Ensures safety during operation Monitors abnormal cooling water, chamber temperature, and overpressure. Made of SUS, the robust water-cooled chamber can be safely used even during continuous operation at maximum temperature. ◉ Compact and space-saving Width 603 x Depth 603 x Height 1,160 mm (*Installed inside rotary pump housing) Various sample heating experiments, such as ultra-high temperature heating of small samples and new material research and development, can be easily performed with simple operations. The main unit is compact yet can be used for research and development in various fields.

Starting from July 2025, we will begin accepting orders for our new product series, the "EX-Bioclean Diaphragm Valve." This product is a next-generation diaphragm valve developed from our existing "Bioclean Diaphragm Valve" series, which is designed for pharmaceutical and related facilities, featuring a new sealing structure. While maximizing the characteristics of the diaphragm valve, such as "a structure that does not contaminate fluids" and "excellent cleanability," we have revamped the sealing structure to better meet user needs and further enhance product performance. 【Main Features】 ■ Currently available on the product page below! *For more details, please refer to the catalog or feel free to contact us.