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By using a composite film with a silicone or fluorine-based non-stick layer on the silica coat Tofumaku, high friction durability and release properties are achieved!

Tofumak is an extremely hard film with properties comparable to quartz, such as hardness and chemical resistance, and it can also possess non-stick properties by compounding the coating. By using an organic solvent solution of Tofumak precursor material (primarily xylene or dibutyl ether) as the coating solution and firing it in the atmosphere, it reacts with moisture and oxygen in the air to yield a high-purity silica (amorphous SiO2) film. Once the solvent evaporates after application, it quickly hardens, and a hard coating with properties comparable to quartz can be obtained through treatment at relatively low temperatures (100-150°C). A very thin film thickness (less than 2μm) can be achieved. Since a one-component treatment solution is used, it is easy to handle. In competing materials (siloxane produced by sol-gel methods), organic groups remain in the silica, and only thin films can be created.