Sienta Omicron Vapor Deposition Source

We have various types of deposition sources available.

A lineup of small area evaporation sources, ion-assisted small area evaporation sources, large area evaporation sources, three-source evaporation sources, atomic hydrogen sources, power supplies for evaporation sources, large area evaporation power supplies, and crucibles for various evaporators. For more details, please contact us or refer to the catalog.

basic information

【Product Lineup】 ○ Small Area Deposition Source EFM2 → Deposition Area: φ5 to φ20mm → Temperature Range: 160 to 3300℃ ○ Small Area Deposition Source EFM3 → Deposition Area: φ5 to φ20mm → Temperature Range: 160 to 3300℃ ○ Ion Assist Small Area Deposition Source EFM3i → Deposition Area: φ5 to φ20mm → Temperature Range: 160 to 3300℃ ○ Large Area Deposition Source EFM4 → Deposition Area: φ10 to φ50mm → Temperature Range: 160 to 3300℃ ○ Triple Source Deposition Source Triple-EFM → Deposition Area: φ8.5, 11, 15mm → Operating Distance: Approximately 93±10mm ○ Large Area Deposition Source EFM6 → Deposition Area: Over φ50mm → Crucible Capacity: Up to 10ccm ○ Atomic Hydrogen Source EFM-H → Acceleration Voltage: 0-1keV (100mA) → Beam Irradiation Angle: ±6 to ±15° (depends on power) ○ Power Supply for Deposition Source EVC100L/100 ○ Power Supply for Deposition Source EVC300/300i ○ Large Area Deposition Power Supply EVC1200 ○ Crucibles for Various Deposition Devices → Crucible Materials: Tungsten, Tantalum, and others ● For more details, please contact us or refer to the catalog.