Negative-type resist materials for microlenses, "PML Series"
It is an acrylic-based negative photoresist material that can be produced in lens shapes.
The "PML series" is a negative resist material that enables pattern formation with lens shapes possessing the following characteristics: ■ High sensitivity: ≧ 50 mJ/cm² ■ High transmittance: ≧ 97% (Average @380~780 nm) *Please feel free to contact us if you have any requests.
basic information
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Model number/Brand name
Negative-type resist material for micro lenses "PML Series"
Applications/Examples of results
It can be used for micro lenses.
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Osaka Organic Chemical Industry Co., Ltd. provides various resin materials that support daily life, based on acrylic acid esters. Our main product, acrylic acid esters, is used as a resin material in a wide range of industrial fields, including paints, inks, adhesives, and electronic materials. Additionally, by utilizing "surface modification and arrangement control" and "high purity" technologies, we are creating new functions and working to expand into new business areas. Moving forward, as a research and development-oriented company, we will continue to offer attractive new products to our customers.