Negative-type resist material for photo spacers (PS) - "GLR Series"
It is a negative-type resist material capable of forming high-resolution columnar patterns.
The "GLR Series" is a negative resist material capable of forming high-resolution columnar patterns with the following characteristics: ■ High sensitivity: ≧ 50 mJ/cm² ■ Good patterning capability: 4–20 μm ■ High transmittance: ≧ 95% ■ Good elastic properties Please feel free to contact us if you have any inquiries.
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Negative-type resist materials for photo spacers (PS) - "GLR Series"
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Osaka Organic Chemical Industry Co., Ltd. provides various resin materials that support daily life, based on acrylic acid esters. Our main product, acrylic acid esters, is used as a resin material in a wide range of industrial fields, including paints, inks, adhesives, and electronic materials. Additionally, by utilizing "surface modification and arrangement control" and "high purity" technologies, we are creating new functions and working to expand into new business areas. Moving forward, as a research and development-oriented company, we will continue to offer attractive new products to our customers.