Osaka organic resist materials
We provide unique resist materials that leverage our proprietary acrylic resin design technology to contribute to the high functionality of advanced devices.
It can be customized to fit your needs and processes. Please feel free to contact us. ■ Photo spacer material - Good patterning properties; line width: 4μm to over 20μm - Thin film compatibility; height: 0.8μm to over 10μm - Low-temperature curing compatibility; firing temperature: ≧120℃ ■ Thick film resist material - Compatible with various shapes; columnar (dot), linear (L/S), lattice, dome-shaped, positive taper, negative taper - Thick film compatibility; height: 10μm to 100μm ■ Micro lens material - High transparency - Low-temperature curing compatibility; firing temperature: ≧100℃ ■ Insulating film material - High chemical resistance, high adhesion, high transparency - Low-temperature curing compatibility; firing temperature: ≧100℃ - Constant temperature and humidity resistance; 85℃/85%RH, 100 V, Ag or Cu wiring board, no change in resistance value for over 500 hours - Flexible compatibility available
basic information
*For more details, please contact us.
Price range
Delivery Time
Applications/Examples of results
*For more details, please contact us.
Line up（6）
| Model number | overview |
|---|---|
| GLR Series | Photo spacer material |
| HTR Series | Thick film resist material |
| PML Series | Micro lens material |
| CHN Series | Insulating film material |
| STC Series | Insulating film material for flexible use |
| FCR Series | Photosensitive acrylic material for flexible use |
