【Delivery Case】Osaka Industrial Technology Research Institute, a local independent administrative agency.
Introducing a case study of a sputtering device capable of automatically creating multilayer films!
We would like to introduce a case where we delivered a magnetron sputtering device to the Osaka Institute of Industrial Technology, a local independent administrative institution. The device delivered this time is our "MS-3C100L model," which consists of a sputtering chamber, a load lock chamber (LL chamber), a vacuum exhaust system, a gas introduction system, a power supply system, a substrate temperature control system, and an operation and control system composed of a PC and control device. The sputtering chamber is equipped with three cathodes for attaching targets, and it is possible to apply RF or DC voltage to each cathode, or to superimpose the voltages. [Case Overview] ■ Delivery Destination: Osaka Institute of Industrial Technology, a local independent administrative institution ■ Delivered Product: MS-3C100L model *For more details, please refer to the PDF document or feel free to contact us.
basic information
【MS-3C100L Software Features】 ■ Film Formation Log Function - Automatic saving of vacuum level, coolant temperature, gas flow rate, sputtering power value, and substrate holder rotation speed for each processing step is possible. ■ Film Formation Recipe Function - Settings for each processing step can include substrate used, target used, vacuum level, coolant setting temperature, gas flow rate, sputtering power value, substrate holder rotation speed, film formation time, and shutter opening/closing. - Combination of pre-created recipes is possible. *For more details, please refer to the PDF document or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please refer to the PDF document or feel free to contact us.
