Plasma Ion Injection Film Deposition Device PBII-R1000
It can also be used as a production machine and is adopted by many users.
The Plasma Based Ion Implantation & Deposition (PBII&D) is a completely new plasma ion implantation technology developed in collaboration with Kurita Manufacturing Co., Ltd. and the Kansai Center of the National Institute of Advanced Industrial Science and Technology, and it has been patented (Patent No. 3555928). DLC coating is also possible. Due to its ease of handling, it can be used as a production machine and has been adopted by many users. For more details, please contact us or refer to the catalog.
basic information
【Features】 ○ Capable of handling a wide range of operations from prototype development to mass production ○ Gas ion implantation and DLC film deposition can be processed with this single unit ○ Capable of processing various materials from metals to insulators by changing film deposition conditions ○ Fully automatic from startup to shutdown ○ Easy to handle, making it suitable for use as a production machine, and adopted by many users ● For more details, please contact us or refer to the catalog.
Price information
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Applications/Examples of results
For more details, please contact us or refer to the catalog.
