DLC film deposition device "Plasma Ion Injection Film Deposition Device"
3D, large-scale, low-temperature processing possible! Plasma ion implantation film deposition device using proprietary development technology.
The "Plasma Ion Injection Film Deposition Device" employs proprietary technology and is a DLC film deposition device capable of three-dimensional, large-scale, and low-temperature processing. It is a uniquely developed device by Kurita Seisakusho and has obtained a patent (Patent No. 3555928). By supplying the output of the pulse RF power source for plasma generation and the high-voltage pulse power source for ion injection from a single electrode, it enables plasma generation tailored to the substrate shape. DLC coating and gas ion injection processing can be performed with this single device. 【Features】 - Capable of three-dimensional shape film deposition - Can accommodate larger devices - Capable of low-temperature processing - Fully automated operation - Reliable log function For more details, please contact us or download the catalog.
basic information
【Lineup】 ○PBll-C600 (R&D Medium Machine) → Compact size → Very short vacuum evacuation time, leading to reduced film formation time ○PBll-R1000 (Standard Machine) → Can also be used as a production machine ○PBll-R1500 (Standard Large Machine) → Large machine with five times the volume of R1000 → Capable of film formation on large and long workpieces with the same ease of use as R1000 ● For more details, please contact us or download the catalog.
Price information
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