Plasma Ion Injection Film Formation Device
This is a completely new DLC coating device from Japan that also allows for gas ion injection.
- It is easy to manufacture large vacuum devices, and we have a track record of delivering large devices with a maximum length of 4m and a diameter of 1.2m. - Cost reduction is possible due to fully automated operation. - In addition to DLC film deposition, simple ion implantation is also possible, enabling the development of new materials. - Since a rotation and revolution mechanism and heater are not required, it is possible to minimize the generation of particles within the vacuum device.
basic information
- The newly developed plasma generation method by Kurita Manufacturing allows for uniform DLC treatment in all directions, even for three-dimensional shapes. - Since the workpiece itself acts as the antenna for plasma generation, there is no need for external antennas or ion sources, making DLC treatment simple. - By using a pulse power supply, treatment at very low temperatures (50℃ and above) has been achieved. - A wide range of materials, from metals to insulators, can be treated with DLC using this single machine.
Price information
Please contact us as it varies depending on the specifications.
Delivery Time
Applications/Examples of results
- There are numerous delivery achievements at AIST, RIKEN, and various universities. - There are also many achievements in original film development in private companies. 【Examples of DLC Film Applications】 - Sealing components for liquid delivery pumps - Cutting blades for food processing - Jigs for semiconductor material processing - Parts for racing cars, etc.
Line up（5）
| Model number | overview |
|---|---|
| PBII-R450 | PBII-R450 is a compact research device. Due to its compact size, it is ideal for specimen production and basic data collection. The small size of the vacuum device also leads to very short vacuum evacuation times, which contributes to reducing experimental time. Despite its size, it leverages the main features of plasma ion implantation deposition equipment, allowing processing of sizes up to 250mm to 300mm. |
| PBII-C600 | PBII-C600 is a device suitable for research and development as well as small-lot production. By adopting a cylindrical chamber, it is easy to achieve uniformity in the distance between the workpiece and the ground, which is expected to improve film thickness uniformity and film quality. Additionally, with a diameter equivalent to Φ650, the effective deposition area has greatly expanded, allowing for processing of relatively large workpieces. |
| PBII-R1000 | PBII-R1000 is a large device with a vacuum chamber size of approximately 1 cubic meter. Therefore, it has a wide effective deposition area, enabling gas ion implantation and DLC coating on various workpieces. It also features double doors, significantly improving the workability for workpiece installation and internal cleaning. Furthermore, by standardly equipping our proprietary high-capacity power supply, stable plasma generation and coating on complex shapes have become possible. |
| PBII-R1500 | PBII-R1500 is a large device with a chamber size of 1500mm in width, 1500mm in height, and a maximum depth of 1800mm, making it five times larger in volume compared to the R1000. It has become possible to deposit films on large and long workpieces with the same ease of use as the R1000. Additionally, by equipping multiple high-capacity power supplies of our proprietary technology, stable plasma generation and coating on large workpieces have been reliably achieved. |
| PBII-C2000 | PBII-C2000 is a large vacuum device with a length of approximately 2m and a diameter of 1.2m. Therefore, it has become possible to deposit DLC films on large workpieces. We also offer an automatic transport cart as an option for transporting heavy items. By setting the workpiece on the transport cart, the connection with the electrodes is automatically performed within the vacuum device, greatly improving workability. By equipping multiple high-capacity power supplies of our proprietary technology, stable plasma generation and deposition on large workpieces have been reliably achieved. |
