Electron microscope-related equipment, electron beam lithography pattern generator SPG-724
It is possible to perform electron beam lithography without compromising the functionality of your SEM.
The pattern generation device SPG-724 for electron beam drawing systems is not intended for semiconductor manufacturing but for research and development of fine circuits, micro-optical components, and nanomachines. The generation and deflection of the electron beam are performed by the SEM itself. By attaching the SPC-724 to the SEM, the observation SEM becomes a drawing device. In addition to the SEM body, the necessary components include a blanking device to turn the beam on and off, a current meter to measure exposure amounts, a pattern generator to send drawing patterns to the blanking device and deflector, and a computer to control these components. 【Features】 ○ Add-on style pattern generation device for EB lithography → Can be attached to various types of SEMs ○ User-friendly design that allows immediate realization of ideas using commercially available CAD ○ No specialized knowledge or skilled techniques required, as with dedicated electron beam drawing machines → Anyone can easily create patterns ○ Achieves batch exposure of wide areas (up to 5mm) For more details, please contact us or download the catalog.
basic information
【Specifications】 [Basic Drawing Functions] ○ Drawing Method: Raster Scan / Block Scan ○ Field Size → Raster Scan: 50/100/200/500μm□ → Block Scan: 1mm to 5mm□ ○ Number of Drawing Pixels → Raster Scan: 1000²/2000²/4000²/5000²/10000² dots → Block Scan: 1000² dots ○ Minimum Address Size: 5nm/dat ○ Dose Time: 0.5μsec/dot to 10msec/dot [Control System] ○ PC (OS): Microsoft Windows ○ CAD: CANVAS [Installation Conditions/Dimensions] ○ Power Capacity: Single-phase 100V 50/60Hz 10A ○ Dimensions: Approximately 450W × 600D × 600Hmm ● For more details, please contact us or download the catalog.
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