DLC De-coating Device (Plasma Cleaner for Precision Molds)

A plasma cleaning device with extensive experience in removing DLC films from aspherical lenses. An essential dry film removal device for the repair of high-value-added molds.

last updated Jun 23, 2020

Single Wafer Plasma Ashing System (SWP Series)

Damage-free, high throughput, multi-purpose compatible high-end devices, compound semiconductors, and MEMS. Extensive track record and comprehensive support. New type now available.

last updated May 12, 2020

Corrosion-resistant water-sealed vacuum pump SW-AS series (stainless steel)

Corrosion-resistant stainless steel (equivalent to SUS316) water-sealed vacuum pump.

last updated Aug 20, 2024

Multi-chamber sputtering device

A lineup with over 20 years of proven history. Customized processes and hardware for high-end niche processes from R&D to mass production.

last updated May 08, 2020

Vacuum exhaust device (vacuum pump unit)

Exhaust system unit with proven performance and reliability. Designed to handle applications that are difficult with a single pump. Enhanced reliability with combinations tailored to the purpose and additional peripheral equipment.

last updated Aug 20, 2024

Single-wafer plasma etching device "EXAM-Σ"

Carefully responding to niche demands. Light etching and ashing for thin wafers and double-sided processing, compact type CtC etching equipment.

last updated Apr 24, 2020

AlN template creation device (sputtering device for oriented AlN films)

AlN templates for UV-LEDs using sputtering. AlN films with high crystallinity and C-axis orientation can be created by sputtering. Latest model deposition equipment.

last updated Apr 28, 2020

Mass production vacuum soldering device (formic acid compatible type)

Standard device for voidless soldering. Proven and reliable hardware and software supporting automotive power device modules.

last updated May 12, 2020

Demonstration of the load lock type sputtering device (single wafer transport type) is currently in progress.

From discrete components to advanced devices, from R&D to mass production. A compact, high-quality, multi-purpose CtoC type sputtering system.

last updated May 13, 2020

Hybrid hard film coating device (DLC-CVD + PVD device)

Composite coating device for CVD-DLC and hard film PVD. Smooth surface PVD film + high-rate DLC. Hardness + tribological thin film.

last updated Apr 13, 2020

DLC coating device for infrared reflection prevention film

A DLC film with high infrared transmittance is formed on both sides of the substrate at a high rate. Achieving next-generation IR coating with stable hard and advanced soft materials.

last updated Apr 07, 2020

Standard Batch Type Vapor Deposition Equipment (AMF Series)

Standard series for electronic device applications. A reliable and comprehensive lineup ranging from multipurpose small research units for R&D to mass production for well-established back electrode applications.

last updated Mar 25, 2020

Water-repellent coating device testing now accepting applications.

Water-repellent coating with plasma treatment. Compatible with resin films through low-temperature processing. Development support through sample testing. Compact type plasma surface treatment device.

last updated Jun 24, 2021

Large vacuum oven

Uniform heating and stable heating under high vacuum or atmospheric pressure; drying, degassing, baking, annealing; multipurpose mass-production vacuum oven.

last updated Jun 04, 2020

Hydrogen annealing device (for electronic devices, currently supporting sample testing)

Uniform heating in atmospheric pressure hydrogen atmosphere. Providing flexible hard support and sample testing with abundant experience and track record for thin films, wafers, compound, and ceramic substrates.

last updated Apr 30, 2020

Mass production plasma cleaning device (large plasma cleaner)

Supports automated mass production lines. Inline type, sheet type, and various types with flexible hardware configurations, all with a proven track record of high effectiveness of vacuum plasma in mass production lines.

last updated Sep 04, 2020

Ittria Coating Device (AF-IP Device)

A yttrium (Y2O3) film with excellent plasma resistance is formed using the PVD method. A thick film (10μm) is achieved with a newly developed ion plating method.

last updated Apr 06, 2020

Simple experimental sputtering device (SRV3100 type)

Compact-type sputtering device exclusively for small substrate, achieving low cost with fully manual operation. Standard type for research and experiments.

last updated Dec 13, 2019

Simple experimental deposition device (EM-645 type)

Simple, compact, high-performance; ideal for experiments and basic research; flexibly customizable according to user needs; standard-type deposition device.

last updated Dec 13, 2019

Large Vapor Deposition Device (AAH Type for Automotive Parts)

Large deposition equipment with extensive experience in film formation for resin exterior products; optimal for film formation of long resin molded products; resin metallization and discontinuous film formation; standard type for mass production of automotive parts.

last updated Dec 09, 2019

Arc filament type ion plating device

High-speed formation of a dense oxide film with a thickness of up to 10 μm. Equipped with a newly developed ionization mechanism, a CVD alternative high-density ion plating device.

last updated Apr 06, 2020

Mass production compatible batch-type sputtering system (Model STH10311)

A batch-type sputtering device equipped with four substrate holders for φ410 substrates, achieving excellent film thickness uniformity within ±5% in the same substrate holder.

last updated Dec 12, 2019

Ultra-High Vacuum Sputtering Equipment (Model STM2323)

Ideal for research and development of advanced thin film devices. A customizable single-sheet ultra-high vacuum inline system. Responding to demands with a wealth of options and flexible support.

last updated Feb 11, 2020

SDR-type roll-to-roll sputtering device (RtoR type sputtering device)

Currently responding to sample tests, developing films and metal foils for flexible devices and advanced functional materials, and supporting mass production. Process support with demo equipment.

last updated May 13, 2020

Batch type SWP assembling device

Damage-free, high rate, large area compatible, complete removal of ion damage, achieving complete radical processing. High-performance plasma ashing device.

last updated Aug 07, 2019

Research and development sputtering equipment

Compact, low-cost, and feature-rich, low-cost sputtering equipment for research and development. Sample testing and facility tours available.

last updated Dec 16, 2019

Plasma etching device "EXAM" sample testing now accepting applications.

A compact batch-type plasma etching device that supports sub-micron etching and features process support through sample testing.

last updated May 13, 2020

Standard Batch Type Sputtering Device (SRV Series)

Multi-functional, compact, flexible support, a standard lineup with proven results and trust.

last updated Feb 11, 2020

Vertical vacuum annealing device

Wafer process-compatible full-scale production system for annealing, sintering, and polyimide curing, supporting high throughput with mini-batch and rapid cooling mechanism.

last updated Aug 06, 2019

Polyimide cure device (300mm wafer compatible clean bake device)

300mm wafer-compatible polyimide cure, baking, low-temperature annealing, compatible with multilayer substrates. Thermal processing equipment for mass production of advanced electronic devices.

last updated Sep 04, 2020