From design to after-service of the equipment! We can offer various equipment proposals.

We would like to introduce a case of the small batch-type sputtering device "SPB-311" developed as a film-forming apparatus. It features a clean exhaust system with a cryopump as the main pump and is equipped with a magnetron cathode. It allows for the selection of RF/DC power supplies. Shinano Seiki supports the entire lifecycle of the device, from design to after-sales service, through collaboration with partner companies. 【Main Specifications】 ■ Clean exhaust system with a cryopump as the main pump ■ Equipped with a magnetron cathode (up to 3 units) ■ Selection of RF/DC power supplies available ■ Substrate rotation mechanism ■ Fully automatic touch panel sequence with manual operation available *For more details, please download the PDF or feel free to contact us.

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