Atmospheric Pressure Plasma Treatment Device "ALDYNE" *For Film Processing and Printing Industry
High energy levels can be sustained stably for a long time! Development of high-performance substrates is now possible!
"ALDYNE" is a device that enhances the adhesion between the substrate and the coating agent. In a mixed gas atmosphere based on nitrogen, plasma discharge is generated, which binds the molecules of the added gas to the substrate surface, producing amide, imide, and amino groups. These functional groups are highly polar and have properties that facilitate covalent bonding with the coating agent, thereby improving the adhesion between the substrate and the coating agent. 【Features】 ■ Advanced adhesion and durability ■ Independent cooling system ■ Compact structural design ■ Optimal electrode type selectable according to the substrate - Metal electrodes suitable for high-speed processing of non-conductive substrates - Temperature-controlled ceramic electrodes suitable for conductive substrates and those with significant thermal effects *For more details, please refer to the PDF document or feel free to contact us.
basic information
【Technical Features】 ■ Improvement of direct adhesion due to molecular structure changes at the 10nm level on the substrate surface ■ Gas sealing structure enabled by a patented inlet and outlet seal zone allows for high-speed processing through efficient plasma discharge ■ Pneumatic-operated electrode box that is easy to clean, set parameters, and maintain ■ Adjustment mechanism at the top of the station allows for accurate and easy setting of the electrode gap *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
