Sonosys Ultrasonic Spray Nozzle
A collaborative product of Rehila's nozzle technology and Sonosys's ultrasonic technology.
Particles (droplets) formed by the ultrasonic spray nozzle are broken up by the vibrations of the piezo element. In other words, unlike pressurized systems, the particles do not have speed. As a result, they either fall naturally or float due to the influence of the wind. Therefore, carrier air is used to transport the formed particles for application.
basic information
Typically, when creating fine particles, pressurization is necessary. Alternatively, a method using two fluids, known as a two-fluid system, is commonly used to break down liquids. However, if the particles have too much velocity, the liquid may scatter, creating a poor environment. To improve this, ultrasonic spray nozzles are often used. Features: - Can supply liquid without pressurization, resulting in low power consumption (lower energy costs) - Uniform atomization regardless of flow rate from minimum flow - Particle size remains relatively consistent across the entire flow range - Resistant to clogging, enhancing workplace safety - Due to the slow self-velocity of the particles, coating efficiency is high - Operating frequency ranges from 45 to 100 kHz (varies by model) - Average particle diameter is approximately 20 μm to 40 μm (note: not a volume average)
Price information
Please feel free to contact us.
Delivery Time
Model number/Brand name
Sonosys Atomizer (ultrasonic spray nozzle)
Applications/Examples of results
- Development liquid spray for silicon, semiconductor wafers, ceramic substrates, etc. - Coating of blood collection tubes with condensates and anti-condensates - Coating on plates and glass - Coating of resin and flux on printed circuit boards - Coating on non-woven fabrics (such as wipes and masks) - Coating on medical products (proteins, antibodies, silicone, lubricants) - Application of pharmaceuticals - Humidification - Surface disinfection (alcohol application) - Disinfection spray for sterile packaging - Continuous coating on parts on a conveyor (lubricant application) - Application of fragrances, seasonings, etc. on products - Adhesive solvents - Fuel cell manufacturing
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Line up（4）
| Model number | overview |
|---|---|
| US-1 | Ultrasonic Atomizer System Typ US1 / 100 kHz / 8 W Flow Rate: 0,1–1 l/h Most Frequent Drop (Water): Ø 20 µm |
| US-2 | Ultrasonic Atomizer System Typ US2 / 58 kHz / 8 W Flow Rate: 0,2–2 l/h Most Frequent Drop (Water): Ø 30 µm |
| US-10 | Ultrasonic Atomizer System Typ US10 / 45 kHz / 8 W Flow Rate: 0,1–10 l/h Most Frequent Drop (Water): Ø 35 µm |
| US-20 | Ultrasonic Atomizer System Typ US20 / 45 kHz / 20 W Flow Rate: 0,2–20 l/h Most Frequent Drop (Water): Ø 38 µm |
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News about this product（26）
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The leaflet for the Sonosys Corporation's Mega Sonic System (FTF Transducer) has been completed.
The SONOSYS 1MHz megasonic system (FTF transducer & MGH generator) is a high-performance system that optimizes the cleaning process of single substrates. Applications and specific processes: Wafer cleaning Photomask cleaning Cleaning of MEMS devices Removal of fine particles from display panels and IC substrates Please refer to the leaflet for more details.
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An article about ultrasonic cleaning devices was published in the January issue of 【Sonosys】 Interface.
Following the December issue of Transistor Technology, an article about the ultrasonic cleaning device manufactured by Sonosys was published in the January issue of Interface.
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An article about the ultrasonic cleaning device was published in the December issue of 【Sonosys】 Transistor Technology.
Ultrasonic cleaning devices are essential for semiconductor cleaning equipment. The ultrasonic cleaning devices provided by Sonosys are unique products in the world and are adopted by many companies. For more details, please visit the URL below.
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We were once again recognized as the top semiconductor technology company in Germany for 2024 in the November issue of Semiconductor Review (this is a remarkable achievement since we received the award in 2022 as well).
In the November issue of Semiconductor Review, we were once again recognized as the top semiconductor technology company in Germany for 2024. Sonosys has outstanding ultrasonic cleaning technology, which is incorporated not only in Germany but also overseas and in cutting-edge ultrasonic cleaning devices in Japan. Comments from CEO Ralf Emberger are also available at the URL below. We kindly ask you to take a moment to read it.
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We will exhibit at SEMICON WEST.
Sonosys, a company known for its ultrasonic cleaning devices and ultrasonic cleaning spray nozzles, will be exhibiting at SEMICON WEST in San Francisco. They plan to showcase their latest ultrasonic cleaning devices and ultrasonic cleaning spray nozzles. Due to the recent semiconductor boom, ultrasonic cleaning devices are being used not only for wafer cleaning but also for cleaning MEMS and optical lenses, among other applications. It is reported that the president of Sonosys will also be present at the booth. Please take this opportunity to visit.
