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What can be done with Ushio's light: "Impurity Diffusion"

What can be done with Ushio's light: "Impurity Diffusion"

This is an introduction to practical examples of Ushio's light sources for optical heating, which have a solid and abundant track record (impurity diffusion). 【Features】 ○ Light sources used: Xenon flash lamp, halogen heater lamp ○ In the semiconductor process, implantation is performed on the source drain, followed by an annealing process to activate the doped impurities. ○ Utilizing the characteristics of the xenon flash lamp, it is possible to perform high-temperature annealing in a very short time frame measured in milliseconds, allowing for extremely shallow areas (on the order of nm) compared to the depth of the previous active layer, thus preventing impurity diffusion. ● For other functions and details, please contact us.

Related Link - https://www.ushio.co.jp/jp/feature/thermal/

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This is an introduction to practical examples of Ushio's light sources for light heating, which have a solid and abundant track record (impurity diffusion). 【Features】 ○ Light sources used: Xenon flash lamps, halogen heater lamps ○ In the semiconductor process, implants are performed on the source drain, followed by an annealing process to activate the doped impurities. ○ Utilizing the characteristics of xenon flash lamps, it is possible to perform high-temperature annealing in a very short time frame (on the order of milliseconds) to extremely shallow depths (on the order of nm) compared to the previous active layer depth, thereby preventing impurity diffusion. ● For other functions and details, please contact us.

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【Purpose】 ○ Activation of impurities injected into the silicon wafer

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Light Application Heating Device "Flash Lamp Annealing Device"

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