[Case Study] RTP (Rapid Thermal Process)
[Case Study] RTP (Rapid Thermal Process)
This is a case study of RTP using light sources for light heating from Ushio, a company with tradition and a wealth of achievements. In the past, semiconductor thermal processing commonly used furnaces (insulated), but for nano-order devices, thin film formation and shallow junctions are required, making RTP, which is synonymous with isothermal processes, a key technology. Additionally, in next-generation semiconductors, flash lamp annealing has become the mainstream technology as a thermal flux technique. ● For other functions and details, please contact us.
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This is a case study of RTP using light sources for light heating from Ushio, a company with tradition and a wealth of achievements. In the past, semiconductor thermal processing commonly used furnaces (insulated), but for nano-order devices, thin film formation and shallow junctions are required, making RTP, which is synonymous with isothermal processes, a key technology. Additionally, in next-generation semiconductors, flash lamp annealing has become the mainstream technology as a thermal flux technique. ● For other functions and details, please contact us.
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