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Notice of the Vaisala Web Seminar on 12/21: "Continuous Concentration Monitoring in CMP Processes to Optimize Wafer Quality and Yield"

ヴァイサラ

Vaisala will hold a webinar on December 21st. In this webinar, we will explain the application of CMP process optimization in semiconductor manufacturing using a refractometer. The CMP process in semiconductor manufacturing requires very precise management of CMP slurry concentration to maintain stable product quality. Instruments capable of measuring corrosive solutions without being affected by bubbles are essential. Based on the principles of refractometry and the features of Vaisala refractometers, we will introduce their applications in such CMP processes. We sincerely look forward to your participation. Main Topics: - What is the CMP process? - Introduction to the features of Vaisala refractometers: 1. Liquid concentration measurement unaffected by bubbles and particles 2. Maintenance-free operation 3. Lineup of corrosion-resistant materials - Case studies of Vaisala refractometers in CMP processes Recommended for: Engineers from semiconductor manufacturing equipment manufacturers, quality control personnel from semiconductor manufacturers, general equipment construction, industrial air conditioning, and production facility personnel.