Contract film deposition service for experimental and research development purposes: "ALD (Atomic Layer Deposition) Equipment"

Assistance with film formation on various samples using the requested precursor. Capable of live demonstrations, comparative evaluations based on parameters, and film thickness measurements.

At Watty, we offer a "contract film deposition service" using ALD equipment. We can deposit various oxide and nitride films such as Al2O3, TiO2, ZrO2, HfO2, RuO2, SiO2, and TiN. The sizes we can accommodate range from small chips to pipes and films, up to 300mm. We respond to various needs, including assistance with film deposition on various samples using your desired precursors, live demonstrations with customer attendance, and evaluations based on your preferred recipes and parameters. ★ If you would like to know more about our services or are considering making a request, please feel free to contact us using the "Contact Us" button below. 【Features】 ■ Capable of depositing various oxide and nitride films (Al2O3, TiO2, ZrO2, HfO2, RuO2, SiO2, TiN, etc.) ■ Can accommodate sizes from small chips to pipes and films, up to 300mm ■ Our technicians provide support for recipe creation and parameter settings ■ We can also accommodate the use of your own precursors ■ Regular small-lot production is possible *For more details, please refer to the PDF document or feel free to contact us.

Related Link - https://watty.co.jp/contract/

basic information

【Features of ALD Equipment】 ■ Reduction of thermal decomposition risk of precursors ■ Particle-free process without bubbling ■ Appropriate temperature management for supply and exhaust lines ■ Heat stage using Hi-Watty (AlN heater) ■ Diverse customization and safety structure ■ Examples of film types (Al2O3, TiO2, HfO2, ZrO2, TiN, AlN, etc.) *For more details, please refer to the PDF document or feel free to contact us. ▼ Contact Information TEL: Sagamihara Office 042-704-5352 MAIL: info@watty.co.jp