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Vacuum Device Thin Fluid Analysis Software 'DSMC-Neutrals'

Analysis of gas flow under low pressure conditions; analysis software compatible with rarefied gases (rarefied fluids).

【Features】 ■ Adopts unstructured mesh, allowing for calculations that accurately reflect the complex shapes of actual devices. ■ High parallel efficiency enables quick computation results even for large-scale geometries. ■ Utilizes a particle method, ensuring convergence to a solution even with poor quality computational grids, unlike fluid models. ■ Comprehensive technical support ensures that even those new to simulation or busy with experiments can reliably achieve results. ◆ Supports various cases ◆ - Simulation of rarefied gas flow within a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Simulation of thin film generation in semiconductor manufacturing processes such as Chemical Vapor Deposition (CVD), Organic Light Emitting Diodes (OLED), and Molecular Beam Epitaxy (MBE). ◆ Outputs various computation results ◆ - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Ability to set multiple reaction equations on the GUI. * For more details, please refer to the catalog or feel free to contact us.

Related Link - http://www.wavefront.co.jp/CAE/dsmc-neutrals/

basic information

**Features** - A simulation software for rarefied fluid using the particle method, useful for experiments and equipment development using vacuum chambers. - Capable of simulating film deposition that includes chemical reactions such as CVD. - Adopts unstructured meshes, allowing calculations that directly reflect the actual shape of the equipment. - High parallel efficiency enables quick computation results even for large-scale shapes. - Unlike fluid models, the particle method ensures convergence to a solution even with poor quality computational grids. - Comprehensive technical support allows beginners in simulation and those busy with experiments to reliably obtain results. - For other features and details, please refer to the catalog.

Price information

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Model number/Brand name

DSMC-Neutrals

Applications/Examples of results

◆ Organic EL (OLED) Simulation * Uniformity of film deposition rate, optimization of shape, temperature dependence of organic material deposition distribution in organic EL simulation, etc. ◆ Molecular Beam Epitaxy (MBE) Simulation * Optimization of molecular beam cell shape, uniformity of deposition distribution, concentration distribution in molecular beam epitaxy simulation, etc. ◆ Showerhead-type CVD (Chemical Vapor Deposition) * Evaluation of deposition rate * Evaluation of film uniformity * Distribution of radicals affecting film growth in the gas phase * Concentration distribution on the substrate surface * Evaluation of gas flow rate and flow volume entering the chamber from the showerhead section ◆ Vacuum Pump Exhaust Simulation * Temperature and cross-sectional area dependence of conductance, effects of gas pockets and outgassing, etc. ◆ Behavior of Macroparticles (Dust) * Effects of macroparticles within the chamber, etc. ◆ Hypersonic Rarefied Flow * Density and temperature distribution around objects, effects of chemical reactions, etc. ◆ Shock Waves ◆ Benard Convection ◆ Behavior of dust within the chamber * Effects of dust on the film that need to consider gravity.

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