Semiconductor Analysis Simulation Software *Catalog available
For reducing man-hours and costs! Capable of various simulations such as thin film generation, sputtering, and plasma etching. Support after implementation is also reliable.
Our company specializes in analysis software for semiconductor-related equipment. We offer a lineup of rarefied fluid analysis software and plasma analysis software, which are actively used in simulations for organic EL and magnetron sputtering. This is for those who are struggling with "wanting to develop new products," "wanting to create and verify actual equipment during product improvements," or "wanting to conduct preliminary verification and comparative verification with equipment." Additionally, since these are in-house developed products, we provide extensive support even after implementation. 【Lineup / Features】 《Rarefied Fluid Analysis Software 'DSMC-Neutrals'》 ■ Supports unstructured meshes, allowing for calculations of complex shapes ■ Capable of simulating gas flow throughout the entire equipment 《Plasma Analysis Software 'Particle-PLUS'》 ■ Capable of low-pressure plasma simulations ■ Useful for research, development, and manufacturing of devices and materials using plasma *For more details, please refer to the materials. Feel free to contact us as well.
basic information
【Other Features】 ■ A simulation software for dilute fluid using particle methods, useful for experiments and equipment development using vacuum chambers. ■ Capable of simulating film deposition that includes chemical reactions such as CVD. ■ Adopts unstructured mesh, allowing calculations to be performed with the actual shape of the equipment. ■ High parallel efficiency enables quick computation results even for large-scale shapes. ■ Unlike fluid models, the use of particle methods ensures convergence to a solution even with poor quality computational grids. ■ Comprehensive technical support allows beginners in simulation and those busy with experiments to reliably achieve results. ◆ Outputs Various Calculation Results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Ability to set multiple reaction equations on the GUI - Film deposition rate distribution - Density distribution of electrons and ions - Distribution of radical and excited species generation - Ion flux distribution - Erosion rate distribution, etc. * For more details, please refer to the materials. Feel free to contact us with any inquiries.
Price information
Please feel free to contact us.
Price range
P5
Delivery Time
P3
Model number/Brand name
『DSMC-Neutrals』『Particle-PLUS』
Applications/Examples of results
◆ Organic EL (OLED) Simulation * Uniformity of film deposition rate, optimization of shape, temperature dependence of organic material deposition distribution in organic EL simulation, etc. ◆ Molecular Beam Epitaxy (MBE) Simulation * Optimization of molecular beam cell shape, uniformity of deposition distribution, concentration distribution in molecular beam epitaxy simulation, etc. ◆ Showerhead-type CVD (Chemical Vapor Deposition) * Evaluation of film deposition rate * Evaluation of film uniformity * Distribution of radicals affecting film growth in the gas phase * Concentration distribution on the substrate surface * Evaluation of gas flow rate and flow volume entering the chamber from the showerhead section ◆ Vacuum Pump Exhaust Simulation * Temperature and cross-sectional area dependence of conductance, effects of gas accumulation and outgassing, etc. ◆ Behavior of Macroparticles (Dust) * Effects of macroparticles within the chamber, etc. ◆ Hypersonic Rarefied Flow * Density and temperature distribution around objects, effects of chemical reactions, etc. ◆ Shock Waves ◆ Benard Convection ◆ Behavior of Dust in the Chamber * Effects of dust on films that need to consider gravity.
