Particle Method 3D Rarefied Fluid Analysis Software 'DSMC-Neutrals'
Analysis of gas flow under low pressure conditions can be performed with analysis software that also supports rarefied gases (rarefied fluids).
**Features** - Adopts unstructured mesh, allowing for calculations that directly reflect the complex shapes of actual devices. - High parallel efficiency enables quick computation results even for large-scale geometries. - Utilizes a particle method, ensuring convergence to a solution even with poor-quality computational grids, unlike fluid models. - Comprehensive technical support ensures that even those new to simulation or busy with experiments can reliably achieve results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations involving chemical reactions like CVD. **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Ability to set multiple reaction equations on the GUI. *For more details, please refer to the catalog or feel free to contact us.*
basic information
【Features】 ● A simulation software for dilute fluid using the particle method, useful for experiments and equipment development using vacuum chambers. ● Capable of simulating film deposition rates and distributions that include chemical reactions such as CVD. ● Adopts unstructured meshes, allowing calculations to be performed directly on the actual shape of the equipment. ● High parallel efficiency enables quick computation results even for large-scale shapes. ● Since it employs the particle method, unlike fluid models, it can achieve convergent solutions even with poor-quality computational grids. ● With comprehensive technical support, it is possible for beginners in simulation or those busy with experiments to reliably obtain results. ● For other features and details, please refer to the catalog.
Price information
Please feel free to contact us.
Delivery Time
Model number/Brand name
DSMC-Neutrals
Applications/Examples of results
◆ Organic EL (OLED) Simulation * Uniformity of film deposition rate, optimization of shape, temperature dependence of organic material deposition distribution in organic EL simulation, etc. ◆ Molecular Beam Epitaxy (MBE) Simulation * Optimization of molecular beam cell shape, uniformity of deposition distribution, concentration distribution in molecular beam epitaxy simulation, etc. ◆ Showerhead-type CVD (Chemical Vapor Deposition) * Evaluation of deposition rate * Evaluation of film uniformity * Distribution of radicals affecting film growth in the gas phase * Concentration distribution on the substrate surface * Evaluation of gas flow rate and flow from the showerhead into the chamber ◆ Vacuum Pump Exhaust Simulation * Temperature and cross-sectional area dependence of conductance, effects of gas pockets and outgassing, etc. ◆ Behavior of Macroparticles (Dust) * Effects of macroparticles within the chamber, etc. ◆ Hypersonic Rarefied Flow * Density and temperature distribution around objects, effects of chemical reactions, etc. ◆ Shock Waves ◆ Benard Convection ◆ Behavior of dust in the chamber * Effects of dust on films, considering gravity.
