Vacuum Exhaust Simulation Software 'DSMC-Neutrals'
Simulation of vacuum exhaust and analysis of gas flow under low pressure conditions, analysis software compatible with rarefied gases (rarefied fluids).
**Features** - By adopting an unstructured mesh, it is possible to calculate the exact shape of complex real devices. - High parallel efficiency allows for quick computation results even for large-scale shapes. - Since it uses a particle method, unlike fluid models, it can achieve a convergent solution even with poor quality computational grids. - With comprehensive technical support, even those new to simulations or busy with experiments can reliably obtain results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film formation simulations involving chemical reactions like CVD. **Outputs Various Computational Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Multiple reaction equations can be set up on the GUI. *For more details, please refer to the catalog or feel free to contact us.*
basic information
**Features** - A simulation software for dilute fluid using the particle method, useful for experiments and equipment development using vacuum chambers. - Capable of simulating film deposition rates and distributions that include chemical reactions such as CVD. - Adopts unstructured meshes, allowing calculations to be performed based on the actual shape of the equipment. - High parallel efficiency enables quick computation results even for large-scale shapes. - Since it employs the particle method, unlike fluid models, it can achieve convergent solutions even with poor quality computational grids. - With comprehensive technical support, even those new to simulations or busy with experiments can reliably obtain results. - For other features and details, please refer to the catalog.
Price information
Please feel free to contact us.
Delivery Time
Model number/Brand name
DSMC-Neutrals
Applications/Examples of results
◆ Organic EL (OLED) Simulation * Uniformity of film deposition rate, optimization of shape, temperature dependence of organic material deposition distribution in organic EL simulation, etc. ◆ Molecular Beam Epitaxy (MBE) Simulation * Optimization of molecular beam cell shape, uniformity of deposition distribution, concentration distribution in molecular beam epitaxy simulation, etc. ◆ Showerhead-type CVD (Chemical Vapor Deposition) * Evaluation of film deposition rate * Evaluation of film uniformity * Distribution of radicals affecting film growth in the gas phase * Concentration distribution on the substrate surface * Evaluation of gas flow rate and flow volume entering the chamber from the showerhead section ◆ Vacuum Pump Exhaust Simulation * Temperature and cross-sectional area dependence of conductance, effects of gas pockets and outgassing, etc. ◆ Behavior of Macroparticles (Dust) * Effects of macroparticles in the chamber, etc. ◆ Hypersonic Rarefied Flow * Density and temperature distribution around objects, effects of chemical reactions, etc. ◆ Shock Waves ◆ Benard Convection ◆ Behavior of Dust in the Chamber * Effects of dust on films that need to consider gravity.
