Wet Bath Monitoring and Analysis Device "TALYS ADP300 Series"
Meeting today's manufacturing needs! A low-cost, high-precision wet bath monitoring analyzer.
The "TALYS ADP300 Series" is a dual-channel analysis system suitable for real-time, batch, or single wafer tool monitoring of wet etching, cleaning, or photoresist (PR) removal processes. By monitoring chemical concentrations in real-time, it reduces the amount of chemicals used by operators and technicians. It enables the suppression of deviations from manufacturing conditions. 【Features】 ■ Usable without specialized knowledge of analytical instruments ■ Operates 24/7, displaying data on the monitor of the analytical instrument ■ Contributes to significant reductions in running costs as it does not require reagents during operation ■ Avoids contamination risks by eliminating the need to change tubes ■ Allows monitoring of additional chemical baths by uploading the electronic configuration file of the analytical instrument via email *For more details, please refer to the PDF document or feel free to contact us.
basic information
【Other Features】 ■ Simultaneous monitoring of chemical concentrations in multiple buses at two sample points ■ The analyzer is fixed in a designated position, allowing easy access to internal components *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
