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Substrate cleaning machine "VSC727" supports pattern shapes with a special brush.

Effective for removing particles between fine pattern patterns! Easy to attach and detach the brush unit!

The substrate and film brush cleaning machine "VSC-727" can flexibly adapt to the shapes between patterns thanks to its special brushes. Unlike adhesive rollers, it is effective in removing particles between fine patterns. It employs a suction conveyor to stably transport thin substrates. 【Features】 - The brush unit can be easily detached and attached without tools. - Equipped with a gap adjuster, it accommodates substrates ranging from 60μ to 3.2mm. For more details, please contact us or download the catalog.

Related Link - http://www.cerma.co.jp/index.html

basic information

【Features】 ○ Flexible response to the shapes between patterns due to a special brush ○ Effective in removing particles between fine patterns ○ Compatible with thin substrates ○ Uses a suction conveyor for stable transport of thin substrates ● For more details, please contact us or download the catalog.

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Substrate and Film Brush Cleaning Machine "VSC-727"

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