Projection Exposure Device "MRS Series" adopts UV-LED light source.
Wafer size post-process projection exposure equipment MRS adopts UV-LED light source as the standard light source (enabling reduction of running costs without sacrificing productivity!)
■ For 8 inches and below, "single exposure method" is available, while for 12 inches, "step and repeat exposure method" can be selected. ■ Achieves high productivity due to a wide exposure area. ■ Has a deep focal depth, with numerous achievements in the MEMS and RF filter industries. ■ Compatible with TAIKO wafers. ■ Global alignment method. ■ High-precision alignment exposure is achieved with a high-rigidity frame. ■ Focus map mechanism is standard equipment.
basic information
- Equipment: Exposure machine, projection exposure machine, stepper - Applications: Semiconductor back-end processes, RF filters, power semiconductors, electronic components, packaging, research - Compatible substrates: Wafers (including special wafers) of various sizes, glass, organic substrates, etc. - Lens features: Resolution of 1.5um or higher, 1:1 magnification, wide angle (4 to 8 inches) - Main body: Up to 12 inches, for research use - All light sources are standard LED Additionally, custom design, lens design, manufacturing, and sales, LED light source sales.
Price range
Delivery Time
Model number/Brand name
MRS
Applications/Examples of results
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