Chemical Contaminant Removal Filter "Risoguard BSMmax Filter"
A filter that protects wafers and lenses from various pollutants and maximizes their lifespan.
The "Risoguard BSMmax Filter" is a cabinet-type chemical filter that exhibits high removal performance against contaminants such as basic and acidic gases, as well as organic gases in the air. It protects wafers and lenses from contamination by various pollutants, maximizing their lifespan. It is ideal for removing airborne contaminants supplied to semiconductor manufacturing equipment, as well as to facilities and areas that require ultra-clean environments. 【Features】 ■ Usable for the removal of various contaminants - Acidic gases (SO2, HCl, HBr) - Basic gases (NH3, NMP, amines) - Condensable organic gases (HMDSO, TMS) ■ Achieves increased adsorption capacity while maintaining the same size compared to conventional activated carbon filters ■ Filters can be reused through the Refill Program ■ A global sales and service network is in place For more details, please contact us or download the catalog.
basic information
【Lineup】 ○P512612 ・Applicable filter system: Risoguard-12 ・Approximate dimensions (width × height × depth): 555 x 430 x 188 mm ・Set airflow rate*: 433 ㎥/hr ・Maximum pressure loss*: 265 Pa ・Approximate weight: 20kg ○P510610 ・Applicable filter system: Risoguard-2.5.7HIGH ・Approximate dimensions (width × height × depth): 630 x 335 x 155 mm ・Set airflow rate*: 355 ㎥/hr ・Maximum pressure loss*: 300 Pa ・Approximate weight: 16kg (*Values per one Risoguard BSMmax filter) For more details, please contact us or download the catalog.
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Applications/Examples of results
【Application】 ○ As a filter for removing chemical contaminants → It is ideal for removing various contaminants from the air supplied to equipment and areas that require ultra-clean environments, including semiconductor manufacturing equipment. For more details, please contact us or download the catalog.
