Chemical filter

Chemical filter
It can be used to achieve the ultra-clean environment required for semiconductor manufacturing and various development experiments and evaluation tests, as well as to prevent performance degradation due to contamination of optical system components.
1~4 item / All 4 items
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Chemical Contaminant Removal Filter "Risoguard BSMmax Filter"
A filter that protects wafers and lenses from various pollutants and maximizes their lifespan.
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Chemical contaminant removal filter "Risoguard LPS Filter"
Chemical filters that protect lenses from various pollutants and further extend their lifespan.
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Chemical filter system "Risoguard 12"
Chemical filter system for high-end semiconductor exposure equipment, such as ArF liquid immersion lithography.
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Inline chemical filter "Risoguard POU Filter"
It is suitable for filtering compressed air in processes that require a high-purity air environment!
last updated